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CuMo Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Copper Molybdenum

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CuMo

Composition

Copper Molybdenum

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

PM

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

Copper Molybdenum sputtering target is fabricated by means of infiltration sintering: Molybdenum powders sintered and formed into the semi-finished products, combined with a subsequent microwave-assisted aqueous solution strategy. Copper Molybdenum alloy has outstanding physical and mechanical properties: satisfactory electrical and thermal conductivity, low and adjustable coefficient of thermal expansion, wear resistance, and high temperature strength.

Compositions (%)

Cu

Mo

Impurity (%)

MoCu10

10±2

Balance

≤0.1

MoCu15

15±3

Balance

≤0.1

MoCu20

20±3

Balance

≤0.1

MoCu25

25±3

Balance

≤0.1

MoCu40

40±5

Balance

≤0.1

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Copper Molybdenum Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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